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University of Michigan - Roy Clarke Group | |||||
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Professor Clarke’s group currently focuses on the physics of novel epitaxial materials, including magnetic and ferroelectric thin-film structures. Questions of interest relate to the unusual properties of thin-film materials that are increasingly important for microelectronics applications. Ongoing research projects include the following:
Experimental facilities available for this work include several ultrahigh vacuum chambers instrumented for vapor deposition, ultrafast laser ablation, and ion-assisted plasma growth techniques. In-situ diagnostics for thin-film growth include scanning tunneling microscopy (STM), Reflection High Energy Electron Diffraction (RHEED), and wafer curvature stress monitoring. Thin-film Kerr magnetometry is also available, including a novel time-resolved MOKE instrument in collaboration with the OPIL and FOCUS ultrafast optics facilities in the Randall Lab. Much of the structural work is carried out at the Advanced Photon Source, a state-of-the-art synchrotron x-ray facility located at Argonne National Lab. The work is supported by private industry, the U.S. Department of Energy Office of Basic Energy Sciences, and the National Science Foundation.
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